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, Vistec INS 3000versusScientific FEI NanoLab 1200 AT FIB

Leica , Vistec INS 3000, Thermo Fisher Scientific FEI NanoLab 1200 AT FIB, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMLeicaThermo Fisher
Category——
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLeica , Vistec INS 3000Thermo Fisher Scientific FEI NanoLab 1200 AT FIB
Specifications
Wafer sizeSingle 150/200 mm wafer loadport[1]High-throughput wafer carrier Kit, (200 mm - 300 mm)[2]
TypeOptical defect review station[1]—
Wafer loadportSingle 150/200 mm wafer loadport[1]—
LightingBright field light source; DIC DUV light source[1]—
CameraUV and DUV camera[1]—
Optics6 optics: 150x, 100x, 50x, 25x, 10x, 5x[1](2) X-Max Detectors, 80 mm HASKRIS Chiller[3]
SoftwareViscon Software[1]—
Data interfaceKLARF input[1]—
Configuration—IXL120 Pump[2]
Modes—SE, BSE[2]
Vacuum—IXL120 Pump[3]
Power—S2 Compliant, 60 Hz[3]
Gas delivery—Carbon deposition precursor[3]
Wafer handling—High-throughput wafer carrier Kit, (200 mm - 300 mm)[2]
(2) 16—10 LCD Monitors, 24"[2]
Operating system—Windows XP Manuals[2]
Sources (3)Every fact above is drawn from these public sources
  1. [1]dealer listingwotol.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com