Comparison ledger
Ontrak DSS 200 Series II Wafer, Semitool 003163-000 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSS 200 Series II WaferOntrak | 003163-000 SRDSemitool |
|---|---|---|
| OEM | Ontrak | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2023 Introduced | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ontrak DSS 200 | Semitool 003163-000 SRD |
| Specifications | ||
| Configuration | Post CMP[1] | — |
| Make | Ontrak[1] | Semitool[3] |
| Model | DSS 200 Series II Wafer[1] | 003163-000[3] |
| Equipment type | Wafer Scrubber[1] | Spin Rinse Dryer (SRD)[3] |
| Wafer sizes | 6 inch[1] | — |
| Tool description | post-CMP semiconductor process tool[2] | — |
| Application | cleaning wafers after chemical mechanical polishing[2] | — |
| Wafer size | 8 inch[2] | — |
| Tool type | Wafer Scrubber[1] | — |
| Process use | Post CMP[1] | — |
| Introduced | 2023[2] | — |
| Power | 200 / 208 / 220 VAC[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Breaker | 25 A (5.2 kW)[2] | — |
| Total FLA | 6.8 A (1.4 kW)[2] | — |
| CDA inlet pressure | 80-100 PSI[2] | — |
| DI water inlet pressure | 60-80 PSI[2] | — |
| Process solutions / chems inlet pressure | 15 PSI[2] | — |
| Noise level during process | 70 dB[2] | — |
| Asset # | — | 139375[3] |
| Last Confirm Date | — | September 03, 2025[3] |
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