Ontrak
DSS 200 Series II Post
What it is
How it works
General reference — not yet source-verifiedAs a post-CMP scrubber, the machine typically applies wet cleaning, mechanical handling, and rinse and dry sequencing to remove polishing residues from the wafer surface. This class of tool is built around controlled fluid delivery, particulate removal, and wafer transport between cleaning stages.
Where it fits in the process flow
General reference — not yet source-verifiedIn a wafer flow, this type of equipment follows CMP and precedes later inspection, deposition, lithography, or other downstream processing steps that depend on a clean surface. Its function is tied to surface conditioning rather than patterning or material removal.
Applications
General reference — not yet source-verifiedTools of this class are used for cleaning planarized wafer surfaces across mature-node process flows and other applications that rely on consistent wafer surface preparation after polishing.
- Post CMP scrubber
- Chemical mechanical polishing
What do the numbers mean?
Power & electrical8
- 50/60 Hz[1]
Vacuum & pumping3
Dimensions & facilities1
Configuration & options12
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Voltage200/ 208 / 220 VAC[1]
- Configuration50/60 Hz[1]
- Breaker25 A (5.2 kW)[1]
- Total FLA6.8 A (1.4 kW)[1]
- CDA (Clean Dry Air)80-100 PSI (Inlet)[1]
- DI Water60-80 PSI (Inlet)[1]
- Process Solutions / Chems15 PSI (Inlet)[1]
- Voltage200 / 208 / 220 VAC[3]
- Total FL6.8 A (1.4 kW)[3]
- Largest Load3.6 A (0.8 kW)[3]
- Voltage200/208/220 VAC (50/60Hz)[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of equipment class is this?General reference — not yet source-verified
It is a CMP-related machine class used in planarization-support or post-process handling workflows.
Does this class perform the polishing itself?General reference — not yet source-verified
Not necessarily. Machines of this class may support the polishing sequence by handling, transferring, or conditioning workpieces around the CMP step.
Where is this class used in production?General reference — not yet source-verified
It is used in process areas that manage substrate movement and surface preparation around CMP operations.
What is this class generally used for?General reference — not yet source-verified
It is generally used to maintain controlled flow, surface condition, and process consistency in CMP-related manufacturing.
Not publicly documented
The following facts about the DSS 200 Series II Post are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the DSS 200 Series II Post are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the DSS 200 Series II Post are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the DSS 200 Series II Post are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the DSS 200 Series II Post are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the DSS 200 Series II Post is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]inventory listing
- [4]inventory listing
- [5]Equipment inventory listing
- [6]Equipment inventory listing
Last updated Jul 30, 2026.
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