Comparison ledger
Oxford Instruments Plasmalab 100 ICP 180 ICP-RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Plasmalab 100 ICP 180 ICP-RIEOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 100 ICP 180 ICP-RIE | Tegal 1512e |
| Specifications | ||
| Manufacturer | Oxford[1] | — |
| Model | Plasmalab 100 ICP 180[1] | — |
| Wafer Size | 2 inch[1] | — |
| Process | Inductively Coupled Plasma Reactive Ion Etch (ICP-RIE)[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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