Comparison ledger
Plasma-Therm RIE790, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | RIE790Plasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm RIE790 | Tegal 1512e |
| Specifications | ||
| Manufacturer | PlasmaTherm[1] | — |
| Model | RIE790[1] | — |
| Process type | Reactive ion etch (RIE)[1] | — |
| Reactor type | Parallel plate[1] | — |
| Chemistries | SF6, CHF3, CF4, O2, Ar[1] | — |
| Etch targets | Semiconductors, dielectrics, metals[1] | — |
| Restriction | None[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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