Comparison ledger
SUSS MicroTec Falcon, SUSS MicroTec Falcon ACS 200 Coater Developer Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FalconSUSS MicroTec | Falcon ACS 200 Coater Developer ClusterSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | Wafer Backside Rinse | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec Falcon | SUSS MicroTec Falcon |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Polyimid[2] | Developer (4)[1] |
| Cassette Elevators | 2[2] | — |
| Developer Dispensers | 2[2] | — |
| Wafer size | Wafer Backside Rinse[3] | — |
| Number of Hot Plates | 0[2] | — |
| Number of Chill Plates | 0[2] | — |
| Controller Type | Microprocessor Controller[2] | — |
| Power Requirements | 380 V, 50/60 Hz, 3 Phase[2] | — |
| OEM | SUSS MicroTec[3] | SUSS[1] |
| Model | Falcon[3] | Falcon ACS 200[5] |
| Category | Resist Processing[3] | Resist Processing[5] |
| Wafer sizes | 6, 8 inch[2] | — |
| Process | Polyimid[2] | — |
| Chambers | 2 chambers[2] | — |
| Hot plates | 0[2] | — |
| Chill plates | 0[2] | — |
| Vintage | 1996[2] | — |
| Gas delivery | 2[3] | — |
| Wafer Sizes | — | 4, 5, 6, 8 inch[4] |
| Configuration (Asset #142142) | — | Developer (4) 2000 Vintage[1] |
| Configuration (Asset #142141) | — | Coater (3) 2000 Vintage[4] |
| Equipment type | — | Coater / Developer Cluster System[5] |
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