Comparison ledger
Tegal 110, Tokyo Electron Tactras RLSA, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 110Tegal | Tactras RLSATokyo Electron |
|---|---|---|
| OEM | Tegal | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tegal 110 | Tokyo Electron Tactras RLSA |
| Cited variants |
| — |
| Specifications | ||
| model | 110 SE[1] | — |
| application focus | process development applications[1] | — |
| process capability | deep silicon plasma etching[1] | — |
| capabilities | very high aspect ratio trench etch and profile control[1] | — |
| configuration | multiple configurations with minimum technical intervention[1] | — |
| System type | plasma etch system[2] | — |
| Supported components | MEMS and 3D-IC components[1] | — |
| Control capability | very high aspect ratio trench etch and profile control[2] | — |
| Physical description | compact[1] | — |
| Configuration | — | Oxide, Nitride, Polysilicon[3] |
| Chamber Type | — | Polysilicon Dry Etch Chamber[4] |
| Wafer Size | — | 300mm[5] |
| Microwave Generator | — | Nihon Koshuha Microwave Generator, Model MKS 050B04C-OSC-V[6] |
| Turbo Pump | — | SHIMADZU FT2301D[6] |
| Top Generator | — | MKS-050B04 PS-V[6] |
| Bottom Generator | — | Daihen RGA-20C[6] |
| Gas Box Configuration | — | N2, TSA, Ar, H2, NF3, SiH4[6] |
| Chuck | — | ESC with Dual He Cooling[6] |
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