Waferpedia

Comparison ledger

1000PversusR3A-LMC

YES 1000P, YES R3A-LMC, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMYESYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1998 Acquisition—
Control system——
Generation——
FamilyYES 1000PYES R3A-LMC
Specifications
Model1000P[1]R3A-LMC[3]
System typePlasma cleaning system[1]—
Shelf configurationFour 16 x 16 inch shelves[1]—
Total capacity1024 square inches[1]—
Control systemPLC driven with plain English real time process readout and diagnostics in the event of system abort[1]—
Number of shelves4[1]—
Shelf size16 x 16 inches[1]—
Power1000 W[2]—
ConfigurationParallel plate[2]—
Operation modesActive, RIE, Downstream[1]—
Sample size rangeFrom smallest semiconductor chip to large flat panels[1]—
TypePlasma cleaning system[1]—
ShelvesFour 16 x 16 inch shelves[1]—
ControlPLC driven with plain English real time process readout and diagnostics in the event of system abort[1]—
Designed for—fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines[3]
Chamber design—parallel plate design[3]
Plasma uniformity—uniform plasma throughout the magazine[3]
Plasma modes—Active Plasma mode, RIE Plasma, Electron-free Plasma[3]
Plasma direction—left to right, right to left, or from both sides simultaneously[3]
Plasma gas inputs—two plasma gas inputs[3]
Back-fill gas input—provided for venting the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen[3]
Diagnostics display—plain English[3]
Readouts—plain English[3]
Function—Automatic plasma cleaning of lead frames and Auer boats[3]
Target products—Lead frames and carrier borne devices loaded into one or two open-sided magazines[3]
Design—Parallel plate design[3]
Gas inputs—Two plasma gas inputs[3]
Control/readout language—Plain English readouts and diagnostics[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]web.archive.orgweb.archive.org