Waferpedia

Comparison ledger

1540 EsB FIB-SEMversus1550

Zeiss 1540 EsB FIB-SEM, Zeiss 1550, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
1550Zeiss
OEMZeissZeiss
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyZeiss 15xxZeiss 15xx
Cited variants—
  • LEO 1550[1]
  • LEO (Zeiss) 1550 Field Emission SEM[2]
Specifications
ConfigurationDual Beam[3]—
OEMZeiss[3]—
Model1540 EsB[3]—
Tool typeFocused Ion Beam - Scanning Electron Microscope (FIB-SEM)[3]—
Included analysisEDX is included[3]—
Detector10mm EDAX detector[4]—
Known issueKnown issue with Ion Pump for FIB capability[3]—
Vintage2014[5]—
Voltage—30 kV[6]
Equipment type—Scanning Electron Microscope (SEM)[6]
Operating voltage—30 kV[6]
SEM source type—Schottky field-emission[2]
Resolution—2-5 nm size range[2]
Accelerating voltage—0.1 - 30 kV[1]
Detectors—Everhart-Thornley, InLens, energy-selected backscattered electrons (ESB)[1]
Spatial resolution—High-vacuum 1.0nm at 20kV; 2.5nm at 1kV[7]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (7)Every fact above is drawn from these public sources
  1. [1]chemie.uni-hamburg.dechemie.uni-hamburg.de
  2. [2]nnci.netnnci.net
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]Equipment inventory listing
  6. [6]inventory listing
  7. [7]serc.carleton.eduserc.carleton.edu