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Filmetrics

F-40-UV

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Filmetrics F-40-UV is a microscope-mounted thin-film measurement system that uses optical reflectometry to non-destructively measure thin-film thicknesses in small patterned areas. The F-40-UV acquires reflection spectra between 400-900 nm and performs curve-fitting to determine thickness and refractive index. The F-40-UV is capable of measuring film thicknesses from several micrometers down to 4 nm.[1][2]

FilmetricsF-40-UV
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How it works

The F-40-UV acquires reflection spectra between 400 and 900 nm using a halogen microscope light source. The spectrometer is capable of detecting wavelengths down to approximately 190 nm, but the standard light source does not support that range. The microscope mounts multiple objectives to provide different measurement spot sizes. The Filmetrics software performs curve-fitting to determine thin-film thickness and refractive index.[2][1]

Applications

Typical applications of the F-40-UV include thickness verification of deposited or etched films, determination of optical constants (refractive index and extinction coefficient), and process characterization of patterned substrates.[1]

The system is also used to measure residual film thickness after etching, allowing verification of etch completion in small patterned areas.[2]

  • Optical film thickness measurement

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Spectrometer is capable of detecting down to UV ~190nm, but the light source does not support this wavelength

What do the numbers mean?

Wafer handling1

Maximum wafer diameter
200 mm (8 in)[1]
Accurate?

Gas & chemistry1

Supported films (NIST)
Oxide on silicon, Nitride on silicon, Polysilicon on oxide on silicon, Photoresist on silicon[1]
Accurate?

Optics & imaging6

Tool type
Optical Film Thickness (Microscope-Mounted)[3]
Accurate?
Film thickness range (NIST)
several micrometers down to 4 nm[1]
Accurate?
Minimum film thickness (UCSB)
≈30 nm for transparent films[2]
Accurate?
Wavelength range
400-900 nm (visible to near-IR)[2]
Accurate?
Microscope objectives (NIST)
15× for UV illumination; 5× and 50× for visible illumination[1]
Accurate?
Microscope objectives (UCSB)
10x, 20x, 50x, 100x, 150x[2]
Accurate?

Configuration & options6

Model
F-40-UV[3]
Accurate?
OEM
Filmetrics[3]
Accurate?
Maximum film thickness (UCSB)
tens of microns[2]
Accurate?
Measurement spot sizes
10 µm, 33 µm, 100 µm[1]
Accurate?
Maximum sample thickness
10 mm[1]
Accurate?
Supported films (UCSB)
Si3N4, SiO2 dielectrics, Si, GaAs, InP semiconductors, metals, photoresists, etc.[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Supported films (NIST)Oxide on silicon, Nitride on silicon, Polysilicon on oxide on silicon, Photoresist on silicon[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

Can it measure on patterned samples?

Yes, the microscope mounting allows measurement in small patterned areas.[2]

Not publicly documented

The following facts about the F-40-UV are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the F-40-UV are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the F-40-UV are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the F-40-UV are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the F-40-UV is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the F-40-UV are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]nist.govnist.govnist.gov
  2. [2]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
  3. [3]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  4. [4]Tool List - UCSB Nanofab Wikiwiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  5. [5]Tool List - UCSB Nanofab Wikiwiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
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Last updated Aug 13, 2026.