Waferpedia

Headway

EC-101

Photoresist spin stationHeadway EC-101 family
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HeadwayEC-101
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  • Plate 01Headway Research EC-101 Spin Coater #59559

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What is it?

The sources identify the equipment as a Headway EC-101 photoresist spin station. It is described as a photoresist-only bench, with vacuum hold-down chucks sized to the sample and a limit of more than 2 people working at the same time stated on the equipment page.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photoresist coating

What do the numbers mean?

Gas & chemistry1

Equipment type
Photoresist Spin Station[1]
Accurate?

Configuration & options4

OEM
Headway[1]
Accurate?
Model
EC-101[1]
Accurate?
Materials allowed
Photoresists only[1]
Accurate?
Max simultaneous users
2 people[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typePhotoresist Spin Station[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the EC-101 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EC-101 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EC-101 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EC-101 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EC-101 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EC-101 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edunanocenter.umd.edunanocenter.umd.edu
  2. [2]PHOTO-09: Photoresist Spin Station- Teaching Lab- 3 | Equipment | Maryland NanoCenter FabLabnanocenter.umd.edunanocenter.umd.edu
  3. [3]Request Equipment Training or Service | Utah Nanofabnanofab.utah.edunanofab.utah.edu
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Last updated Jul 29, 2026.