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Headway

EC-101D

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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Headway EC-101D is a photoresist spin station. The Headway EC-101D has adjustable spin speeds from 50 to 10,000 RPM. The Headway EC-101D has a manual control with an automated timer.[1][2]

HeadwayEC-101D
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  • Plate 01Headway Research 1-EC101D-R485 Spin Coater #59426

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Vacuum

Fail-safe vacuum interlocks[1]

Gas delivery

Photoresist Spin Station[1]

What it is

The Headway EC-101D is a photoresist spin station. The Headway EC-101D has adjustable spin speeds from 50 to 10,000 RPM. The Headway EC-101D is manually controlled with an automated timer. The Headway EC-101D has an LCD motor speed readout. The Headway EC-101D has vacuum hold down chucks for alternate substrate sizes, fail-safe vacuum interlocks, bowl exhaust, removable bowl liners, and automatic dynamic breaking.[1][2][3]

How it works

The Headway EC-101D uses vacuum hold down chucks for alternate substrate sizes. The Headway EC-101D includes fail-safe vacuum interlocks. The Headway EC-101D includes bowl exhaust and removable bowl liners. The Headway EC-101D includes automatic dynamic breaking. The Headway EC-101D uses manual control with an automated timer and provides an LCD motor speed readout.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

Photoresist spin stations sit in the lithography preparation flow before exposure and development. Photoresist spin stations are used after substrate preparation and before the coated surface proceeds to soft bake, alignment, exposure, and later wet processing.

Applications

The Headway EC-101D is used for photoresists. The associated operating procedure prohibits use of acids, caustics, and developer in the bench, and directs other polymeric materials and spin-on glasses to a separate polymer spin station.[1][2]

What do the numbers mean?

Vacuum & pumping3

Substrate handling
Vacuum hold down chucks for alternate substrate sizes[1]
Accurate?
Safety interlock
Fail-safe vacuum interlocks[1]
Accurate?
Exhaust
Bowl exhaust[1]
Accurate?

Gas & chemistry1

Equipment type
Photoresist Spin Station[1]
Accurate?

Control & software1

Control mode
Manual controlled with automated timer[1]
Accurate?

Configuration & options6

OEM
Headway[1]
Accurate?
Model
EC-101D[1]
Accurate?
Spin speed range
50-10,000 RPM[1]
Accurate?
Display
LCD motor speed readout[1]
Accurate?
Bowl liner
Removable bowl liners[1]
Accurate?
Braking
Automatic dynamic braking[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typePhotoresist Spin Station[1]
  • Substrate handlingVacuum hold down chucks for alternate substrate sizes[1]
  • Safety interlockFail-safe vacuum interlocks[1]
  • ExhaustBowl exhaust[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What spin speed range does the Headway EC-101D provide?

The Headway EC-101D has adjustable spin speeds from 50 to 10,000 RPM.[1][2]

How is the Headway EC-101D controlled?

The Headway EC-101D is manually controlled with an automated timer and has an LCD motor speed readout.[1][2]

What substrate holding arrangement does the Headway EC-101D use?

The Headway EC-101D uses vacuum hold down chucks for alternate substrate sizes and includes fail-safe vacuum interlocks.[1][2]

What bowl and exhaust features are present on the Headway EC-101D?

The Headway EC-101D includes bowl exhaust, removable bowl liners, and automatic dynamic breaking.[1][2]

What materials is the Headway EC-101D bench intended to handle?

The operating procedure limits the bench to photoresists. The operating procedure directs other polymeric materials and spin-on glasses to a separate polymer spin station, and it prohibits acids, caustics, and developer in the bench.[1][2]

Not publicly documented

The following facts about the EC-101D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EC-101D are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EC-101D are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EC-101D are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EC-101D are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EC-101D is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
  2. [2]https://www.nanocenter.umd.edu/equipment/fablab/sops/photo-09/Photo-09%20-%20SOP%20-%20Photoresist%20Spin%20Station.pdf — nanocenter.umd.edunanocenter.umd.edu
  3. [3]EC-101D — Headway | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 17, 2026.