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Headway

EC-101D

photoresist spin stationHeadway EC-101D family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

HeadwayEC-101D
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  • Plate 01Headway Research 1-EC101D-R485 Spin Coater #59426

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What is it?

General reference — not yet source-verifiedHeadway EC-101D is a photoresist spin station. Machines of this class are used to apply thin, uniform liquid films to substrates by rotational spreading before downstream lithography processing.

What do the numbers mean?

Gas & chemistry1

Equipment type
Photoresist Spin Station[1]
Accurate?

Configuration & options2

OEM
Headway[1]
Accurate?
Model
EC-101D[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typePhotoresist Spin Station[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What does a photoresist spin station do?General reference — not yet source-verified

It applies a liquid photoresist to a substrate and uses rotation to spread it into a thin, even film for later patterning.

What kind of process is it part of?General reference — not yet source-verified

It is part of the wet-process and lithography preparation sequence, typically before exposure and development.

Why is spinning used instead of simple pouring or brushing?General reference — not yet source-verified

Spinning helps produce a more uniform coating and removes excess liquid from the surface in a controlled way.

What substrates are handled by this class of machine?General reference — not yet source-verified

Machines of this class are generally used for flat precision substrates such as wafers or similar parts that need a repeatable resist film.

What is the main purpose of the coating?General reference — not yet source-verified

The coating serves as a light-sensitive layer that can be patterned in later lithography steps.

Not publicly documented

The following facts about the EC-101D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EC-101D are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EC-101D are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EC-101D are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EC-101D are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EC-101D is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
  2. [2]https://www.nanocenter.umd.edu/equipment/fablab/sops/photo-09/Photo-09%20-%20SOP%20-%20Photoresist%20Spin%20Station.pdf — nanocenter.umd.edunanocenter.umd.edu
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Last updated Jul 29, 2026.