Orient Service
S 1861 14
What it is
The Orient Service S 1861 14 is a PECVD system used for plasma-enhanced chemical vapor deposition.[1]
The Orient Service S 1861 14 is a semiconductor deposition tool identified with the model designation S 1861 14 and the make Orient Service.[1]
How it works
General reference — not yet source-verifiedA PECVD system uses plasma to activate chemical reactions in a process chamber so thin films can form from gaseous precursors on a substrate.
Deposition tools of this class typically meter process gases into a controlled chamber, sustain a plasma above the wafer surface, and build films through surface reaction and film growth.
Where it fits in the process flow
General reference — not yet source-verifiedThe Orient Service S 1861 14 sits in the thin-film deposition portion of semiconductor processing.
Deposition equipment of this class commonly follows earlier wafer preparation and patterning steps and supplies insulating or functional films before later etch, lithography, or thermal steps.
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Missing bower, sump pump, circulate pump, and heater
- Missing heater, sump pump, and circulate pump
- Missing heater
What do the numbers mean?
Vacuum & pumping2
Gas & chemistry3
Configuration & options7
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Applied Materials Producer SE— Same function class: Deposition, nullCompare in depthsource[1]
- Applied Materials P 5000 Mark II DLH— Same function class: Deposition, nullCompare in depthsource[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationMissing bower, sump pump, circulate pump and heater[1]
- ConfigurationMissing heater, sump pump, circulate pump[2]
- TechnologyPECVD (Plasma-Enhanced Chemical Vapor Deposition)[1]
- Process chemistrySiO2, HCl, HF, NOx, NH3, etc.[1]
- Equipment typePECVD (Plasma-Enhanced Chemical Vapor Deposition)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the S 1861 14 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 1861 14 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 1861 14 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 1861 14 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the S 1861 14 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the S 1861 14 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]inventory listing
- [3]inventory listing
Last updated Oct 13, 2026.
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