NexION 350 X ICP-MS

An inductively coupled plasma mass spectrometer is an analytical instrument used to detect and measure elemental composition at trace levels. ICP-MS systems generally ionize a sample in a plasma source and then separate and detect ions by mass-to-charge ratio.

ICP-MS instruments generally introduce a prepared sample into a plasma, where the sample is atomized and ionized. ICP-MS instruments generally transfer those ions into a mass spectrometer under vacuum for separation and detection. ICP-MS instruments generally rely on associated sample handling, pumping, and control subsystems to support routine analytical operation.

ICP-MS instruments are analytical tools rather than wafer patterning or material deposition tools. ICP-MS instruments generally sit in materials analysis, contamination control, failure analysis, and laboratory support workflows that inform process development and manufacturing quality work.

ICP-MS instruments generally receive samples after collection or preparation from process materials, chemicals, water, consumables, or product-related investigations. ICP-MS results generally feed downstream decisions in process monitoring, root-cause analysis, and qualification of materials or cleaning effectiveness.

ICP-MS instruments are generally used for elemental analysis of liquids and digested materials in industrial and laboratory environments. ICP-MS instruments are commonly applied where trace metal contamination, material purity, or elemental composition must be measured.

In semiconductor-related contexts, ICP-MS instruments generally support contamination studies on chemicals, rinse media, process materials, and related samples. ICP-MS instruments also support investigative work tied to yield excursions, cleanliness verification, and materials characterization.