Pfeiffer
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The ADP 122 P features wide interstage channels that can accommodate large quantities of powder and particles. The pump uses vertical pumping on each stage, which prevents particulate accumulation in the swept volume. The pump has an integrated silencer and is Semi S2 compliant. The pump's mechanism is frictionless and oil-free. The nitrogen purge level is easily set by the customer.[2][3]
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The peak pumping speed is 95 m³/h at 50 Hz and 112 m³/h at 60 Hz.[2][3]
The ultimate pressure is 3 × 10⁻² mbar at 50 Hz and 1.5 × 10⁻² mbar at 60 Hz.[2][3]
Yes, the ADP 122 P includes an N₂ purge option, and the nitrogen purge level is easily set by the customer.[2][3]
The series 2 model has a width of 390 mm. The pump weighs 400 lbs.[3]
The following facts about the Alcatel ADP 122 P Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alcatel ADP 122 P Dry are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alcatel ADP 122 P Dry are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alcatel ADP 122 P Dry are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alcatel ADP 122 P Dry are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alcatel ADP 122 P Dry is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Aug 20, 2026.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.