Temescal

FC-4400

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The Temescal FC-4400 is a load-locked evaporation deposition system for lift-off oriented processes. The Temescal FC-4400 supports the metallization of up to 30 150 mm wafers per load. The Temescal FC-4400 supports the metallization of up to 15 200 mm wafers per load.^[1]^[2]

TemescalFC-4400

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Power

6, 12, or 15 kW^[1]

Vacuum

44,000^[1]

How it works

The Temescal FC-4400 uses the Temescal Control System, with auto, manual, and service modes plus process datalogging. The Temescal Control System provides recipe-driven process and vacuum control. The Temescal Control System offers process variable monitoring, historical trend tracking, and process data logging. The Temescal Control System uses a 17 inch high-resolution color touch screen interface. The Temescal Control System automatic mode provides fully automated execution of user-programmed recipes consisting of up to twenty process steps, along with independent autopump and autovent operations, automated cryopump regeneration, and automated rate-of-rise testing.^[1]

What do the numbers mean?

Power & electrical1

E-gun power supply: 6, 12, or 15 kW^[1]

Vacuum & pumping2

Cryopump water L/sec: 44,000^[1]
Pump down time: 1E-06^[1]

Wafer handling5

Wafer capacity: Up to 30 x 150 mm wafers per load^[1]
Wafer capacity: Up to 15 x 200 mm wafers per load^[1]
Load lock: Present^[1]
Source-to-substrate distance: 38 in standard^[1]
Source-to-substrate distance with extension collar: 42 in^[1]

Control & software2

System control: Temescal Control System (TCS)^[1]
Control modes: Auto, Manual, and Service modes^[1]

Dimensions & facilities1

Product chamber dimensions: 23.5 in high x 44 in x 44 in^[1]

Configuration & options9

Brand: Temescal^[4]
Model: FC-4400^[4]
System type: Deposition system^[1]
Process focus: Lift-off oriented evaporation^[1]
Product chamber type: Box^[1]
Ion gun: MKII HC^[1]
Source tray diameter: 25.5 in^[1]
Process data logging: Supported^[1]
Model designation listed: Temescal FC-4400^[4]

Vintage & configurations

2007First version of manual^[3]
The first version of the FC-4400 manual applied to systems built between Oct. 2007 and June 2010.

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What replaced it?

siblingTemescal UEFC-5700source^[5]
siblingTemescal FC-3800— Listed in the same Temescal Systems product linesource^[5]
siblingTemescal FC/BCD-2800— Shown alongside FC/BCD-2800 in the Temescal Systems lineup.source^[6]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Cryopump water L/sec44,000^[1]
Pump down time1E-06^[1]
E-gun power supply6, 12, or 15 kW^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What deposition method does the FC-4400 use?

The Temescal FC-4400 is designed for high-capacity electron-beam evaporation.^[1]

Not publicly documented

The following facts about the FC-4400 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the FC-4400 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FC-4400 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FC-4400 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FC-4400 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FC-4400 are on record.
Answerable by: an OEM parts catalog or a service engineer