Temescal
TES 600
What it is
The TES 600 is a sputtering deposition system in the Temescal TES family.[1]
How it works
The TES 600 uses a fast cycle dual level load lock for exchanging a completed pallet load of substrates with a new pallet load.[1]
The TES 600 moves the substrate pallet in a linear motion in front of up to three magnetron cathodes.[1]
The TES 600 places RF etch and substrate heating in the process chamber.[1]
Where it fits in the process flow
The TES 600 supports continuous operation through exchange of a completed pallet load with a new pallet load.[1]
Applications
The TES 600 is used for sputtering deposition in thin film process work.[1]
What do the numbers mean?
Power & electrical1
Wafer handling3
Performance1
Configuration & options3
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| TES 900 | — | — | Vertical process chamber (as opposed to horizontal for TES 600) | tescal.com[1] |
What replaced it?
Related models
- siblingTemescal TES 900— Horizontal-process variant of the same basic platformsource[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Integrated processesRF etch and substrate heating in process chamber[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate load does the TES 600 exchange through its load lock?
The TES 600 exchanges a completed 12 by 12 pallet load of substrates with a new pallet load.[1]
How many cathodes can the TES 600 use in front of the moving pallet?
The TES 600 can move the pallet in front of up to three 5 by 15 magnetron cathodes.[1]
Does the TES 600 include RF etch and substrate heating in the process chamber?
The TES 600 includes RF etch and substrate heating in the process chamber.[1]
Not publicly documented
The following facts about the TES 600 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TES 600 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the TES 600 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TES 600 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TES 600 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the TES 600 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]tescal.com — tescal.comtescal.com
Last updated Oct 3, 2026.
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