CV200

The YES CV200 is a plasma strip and descum system used for photoresist removal, polyimide removal, organics removal, CD master cleaning, and descum processes. The CV200RF Series includes YES-CV200RF and YES-CV200RFS variants. The YES-CV200 systems remove thick layers of photoresist or polyimide. The YES-CV200 systems provide touch screen control, real time pictorial readout of system status and maintenance requirements, and process data output to a recording computer for Microsoft Excel reporting.^[1][3]

The YES CV200RF Series uses capacitive plasma generation at a plasma generation frequency of 40 kHz. The YES CV200RF Series provides variable plasma power settings from 150 watts to 1250 watts. The YES CV200RF Series uses a downstream process in which plasma passes through a grounded, perforated plate before reaching substrates. The YES CV200RF Series offers precise temperature control. The YES CV200RF Series comes standard with four process gas connections. Mass flow controllers are available as an option for mixing gases. Automatic downstream process control, mass flow controllers, and data collection and analysis are offered as options.^[3][1]

The YES CV200 RFS has been used to strip residual photoresist after direct laser write lithography and silicon etching in metasurface fabrication. The YES CV200 RFS has also been used as an O2 plasma asher to remove resist crust during detector fabrication processing.^[4][5]

The YES CV200 is applied to photoresist removal, polyimide removal, organics removal, CD master cleaning, and descum processes. The YES CV200 provides a stripping mode for tough or thick resist and a gentler descum function for cleaning operations. The YES CV200RF Series reports strip rates up to 6,000-7,000 Angstroms per minute.^[1][3]