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YES

CV200

Plasma Strip/Descum SystemYES CV200 family
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CV200 — web.archive.org
Fig. 01CV200web.archive.org[1]

  • Plate 01Blue Bird CV200 School Bus Brochure

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  • Plate 02Non invasive ventilation..CV200 PM Cares ventilator..basics and demo for beginners #dramitkamat

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Power

150 watts to 1250 watts[1]

Gas delivery

Four process gas connections standard[1]

What is it?

The CV200RF Series is described as a YES plasma strip/descum system line, with YES-CV200RF and YES-CV200RFS variants listed on the source pages. The system is described as removing thick layers of photoresist or polyimide in short production time, with touch screen control, real-time pictorial status and maintenance readout, and process data output to a recording computer for Excel reporting.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photoresist removal
  • Polyimide removal
  • Organics removal
  • CD master cleaning
  • Descum processes

What do the numbers mean?

Power & electrical2

Variable plasma power
150 watts to 1250 watts[1]
Accurate?
Plasma generation frequency
40 kHz[2]
Accurate?

Wafer handling1

Automated wafer handling
YES-CV200RF specs are listed as automated wafer handling[2]
Accurate?

Gas & chemistry3

Applications
Photoresist removal, polyimide removal, organics removal, CD master cleaning, descum processes[1]
Accurate?
Process gas inputs
Four process gas connections standard[1]
Accurate?
Options
Mass flow controllers, automatic downstream process control, data collection and analysis[1]
Accurate?

Control & software2

Controls
Touch screen control and real-time pictorial readout of system status and maintenance requirements[1]
Accurate?
Data output
Process data is output to a recording computer and compiled into a Microsoft Excel report[1]
Accurate?

Configuration & options2

System line
CV200RF Series[1]
Accurate?
Plasma strip rate
Up to 6,000-7,000 Angstroms per minute[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
YES-CV200RF——Listed as having automated wafer handling.web.archive.org[2]
YES-CV200RFS——Listed as a model in the CV200RF Series.web.archive.org[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ApplicationsPhotoresist removal, polyimide removal, organics removal, CD master cleaning, descum processes[1]
  • Variable plasma power150 watts to 1250 watts[1]
  • Plasma generation frequency40 kHz[2]
  • Process gas inputsFour process gas connections standard[1]
  • OptionsMass flow controllers, automatic downstream process control, data collection and analysis[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the CV200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CV200 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the CV200 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the CV200 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the CV200 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the CV200 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]web.archive.org — web.archive.orgweb.archive.org
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Last updated Jul 29, 2026.