ASML

PAS 5500 300 C alternatives

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Comparable Lithography equipment documented in the Waferpedia catalog.

ASML PAS 5500 300 C entry →All Lithography tools →

6 comparable tools

Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
SUSS MicroTec
150 e Mask
Lithography
The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.
Ultratech
1500
Lithography

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