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200 PCUversusNV GSD 100

Axcelis 200 PCU, Axcelis NV GSD 100, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
200 PCUAxcelis
NV GSD 100Axcelis
OEMAxcelisAxcelis
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2000 Vintage—
Control system——
Generation——
FamilyAxcelis NV GSD 200Axcelis NV GSD 100
Cited variants
  • Fusion 200 PCU[1]
  • Fusion 200 PCU-P[2]
—
Specifications
P/NSC 4840 A[3]—
Frequency50 Hz[3]—
Phase3 Phase[3]3 Phase[4]
Voltage400 V[3]—
Input—208 V[4]
Output—160 KV[4]
Power—50 KVA[4]
Current—15 MA[4]
Configuration—Electron Shower[4]
Type—Ion implanter[5]
Input voltage—208 V[4]
Electron shower—Present[6]
Drive—Direct drive[6]
Cell—Cell V6[4]
Control/software—Solaris[6]
Gas box—SDS Gas Box[6]
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Sources (6)Every fact above is drawn from these public sources
  1. [1]exapro.comexapro.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com
  6. [6]waferpedia.comwaferpedia.com