Comparison ledger
Hitachi CG 4100, KLA SFS 6420, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | CG 4100Hitachi | SFS 6420KLA |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | — | — |
| Wafer size | Wafer Equipment | Wafer Equipment |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi CG 4100 | KLA SFS 6420 |
| Specifications | ||
| Wafer size | Wafer Equipment[1] | Wafer Equipment[2] |
| Date of Manufacture | 2013-01-01[1] | — |
| Currently Configured for | 300mm[1] | — |
| Missing or Damaged parts | Fab confirmed there were no missing or damaged parts.[1] | — |
| Vendor | HITACHI[1] | — |
| VID | VID761[1] | — |
| SW Version | 35.47[1] | — |
| Resolution | 1.8nm[1] | — |
| throughput | 42wafer/h[1] | — |
| MAM Time | 2.8sec[1] | — |
| Stage Landing Accuracy | ±1μm[1] | — |
| Power | — | 220V 50Hz 1 Phase[2] |
| Manufacturer | — | KLA-Tencor[2] |
| Model | — | SFS 6420[2] |
| Year | — | 1995[2] |
| Condition | — | Used[2] |
| Inspection type | — | Non-patterned wafer particle inspection[3] |
| Light source | — | Algon laser[3] |
| Voltage | — | 208V[3] |
| Phase | — | 1 phase[3] |
| Frequency | — | 50/60Hz[3] |
| Vacuum | — | ~-23 inHg[3] |
| External exhaust | — | 4" diagram, 2 holes for system and laser[3] |
| System software | — | 4.2[3] |
| Operating system | — | Windows 98[3] |
| Install type | — | stand-alone[3] |