KLA
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The KLA SFS 6420 is a standalone wafer inspection system for non-patterned particle detection. The KLA SFS 6420 is compatible with 150 mm and 200 mm wafers. The KLA SFS 6420 uses an Algon laser source.[1]
The KLA SFS 6420 is a standalone wafer inspection system for non-patterned particle detection. The system is compatible with 150 mm and 200 mm wafers. The SFS 6420 uses an Algon laser source.[1]
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The SFS 6420 supports 150 mm and 200 mm wafers.[1]
The SFS 6420 uses an Algon laser source.[1]
The SFS 6420 requires 208 V, single phase, 50/60 Hz power.[1]
The system requires vacuum at approximately -23 inHg (specified >-20 inHg) with a quick-connection fitting, and a 4-inch exhaust diagram with two holes for the system and laser.[1]
The system runs Windows 98 as the operating system and system software version 4.2.[1]
The following facts about the SFS 6420 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SFS 6420 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SFS 6420 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SFS 6420 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SFS 6420 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SFS 6420 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 13, 2026.
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ADE AFS-3220 is a wafer characterization metrology tool configured for 300mm wafers.