Lam Research
Alliance A 6 9400 DSIE III Process alternatives
Comparable semiconductor equipment documented in the Waferpedia catalog.
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The KLA .498 PSL Wafer is a NIST traceable reference wafer.
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The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
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0010-13627 High Efficiency RF Match
The Applied Materials 0010-13627 is a high efficiency RF match designed for semiconductor equipment.
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