Nikon

NSR 2005 i 9 C i-Line alternatives

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Comparable Lithography equipment documented in the Waferpedia catalog.

Nikon NSR 2005 i 9 C i-Line entry →All Lithography tools →

6 comparable tools

Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
SUSS MicroTec
150 e Mask
Lithography
The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.
Ultratech
1500
Lithography

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