Tegal
1512e alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
Oxford Instruments
100 ICP Fluorine
Etch
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.
Axcelis
200 ACU
Etch
The Axcelis 200 ACU is an asher or plasma asher used in semiconductor processing.
Plasma-Therm
210RL-A
Etch
The Plasma-Therm 210RL-A is a reactive-ion etch (RIE) system designed for semiconductor and microelectromechanical systems (MEMS) fabrication, belonging to the class of plasma-based dry etching equipment.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare 1512e with another model →