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RS 35 Sheet Resistance Measurementversus, Vistec INS 3000

KLA RS 35 Sheet Resistance Measurement, Leica , Vistec INS 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMKLALeica
Category——
Wafer sizeOne wafer manual loader200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA RS 35Leica , Vistec INS 3000
Cited variants
  • RS 35 C Sheet Resistance Measurement[1]
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Specifications
Wafer sizeOne wafer manual loader[2]Single 150/200 mm wafer loadport[3]
ConfigurationScan stage[2]—
Process vac23 InHg[2]—
CDA100 PSI[2]—
Inlet Power1 line of 115 vac, 8 amp[2]—
Wafer Size6 inch[2]—
Wafer HandlingOne wafer manual loader[2]—
Scan StageYes[2]—
Process Vacuum23 InHg[2]—
Type—Optical defect review station[3]
Wafer loadport—Single 150/200 mm wafer loadport[3]
Lighting—Bright field light source; DIC DUV light source[3]
Camera—UV and DUV camera[3]
Optics—6 optics: 150x, 100x, 50x, 25x, 10x, 5x[3]
Software—Viscon Software[3]
Data interface—KLARF input[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]dealer listingwotol.com