Comparison ledger
Ontrak DSS 200 Series II Wafer, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSS 200 Series II WaferOntrak | 1000FPYES |
|---|---|---|
| OEM | Ontrak | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2023 Introduced | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ontrak DSS 200 | YES 1000FP |
| Specifications | ||
| Configuration | Post CMP[1] | — |
| Make | Ontrak[1] | — |
| Model | DSS 200 Series II Wafer[1] | Glen/YES 1000FP[3] |
| Equipment type | Wafer Scrubber[1] | — |
| Wafer sizes | 6 inch[1] | — |
| Tool description | post-CMP semiconductor process tool[2] | — |
| Application | cleaning wafers after chemical mechanical polishing[2] | — |
| Wafer size | 8 inch[2] | — |
| Tool type | Wafer Scrubber[1] | — |
| Process use | Post CMP[1] | — |
| Introduced | 2023[2] | — |
| Power | 200 / 208 / 220 VAC[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Breaker | 25 A (5.2 kW)[2] | — |
| Total FLA | 6.8 A (1.4 kW)[2] | — |
| CDA inlet pressure | 80-100 PSI[2] | — |
| DI water inlet pressure | 60-80 PSI[2] | — |
| Process solutions / chems inlet pressure | 15 PSI[2] | — |
| Noise level during process | 70 dB[2] | — |
| System type | — | Plasma cleaning system[3] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[3] |
| Designed use | — | Designed to accept a range of shelf sizes[3] |
| Application focus | — | Changing needs of the flat panel industry[3] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →