Waferpedia

Comparison ledger

870versus880

Semitool 870, Semitool 880, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
870Semitool
880Semitool
OEMSemitoolSemitool
CategorySpin Rinser/DryerSpin Rinser/Dryer
Wafer size3"4"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 870Semitool 880
Cited variants—
Specifications
Tool typeSpin Rinser/Dryer[3]—
Wafer boats3" and 4" wafer boats[3]—
Rinse mediumDI water[3]DI water to 15 MΩ[4]
Rinse purityto 15 MΩ[3]—
Drying methodheated nitrogen[3]Heated nitrogen[4]
CategorySpin Rinser/Dryer[3]—
Drying mediumheated nitrogen[3]—
Wafer size3"[1]—
Wafer capacityup to 150mm / 6" wafers[2]—
Process chambers2 process chambers[2]—
Function—Spin Rinser/Dryer[4]
Boat compatibility—4" and 5" mask boats, plus 6" wafer boat on request[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]sitekprocess.comsitekprocess.com
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  4. [4]nanofab.ece.cmu.edunanofab.ece.cmu.edu