Heidelberg Instruments MLA150

Models in this family

1. 

   MLA150

   The Heidelberg Instruments MLA150 is a mask-less direct-write lithography system for exposing photoresist on substrates without a photomask.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   MLA150 - 1	—	—	Listed as one of the MLA150 system entries; source provides separate specifications for this unit.	epfl.ch[1]
   MLA150 - 2	—	—	Listed as one of the MLA150 system entries; source provides separate specifications and grayscale/high aspect ratio options for this unit.	epfl.ch[1]
   MLA150-1	—	—	Maximum substrate size 220 x 220 x 8 mm; 375 nm laser power 2800 mW; writing time with 375 nm laser on a 100 mm wafer is < 32 min (Fast mode).	epfl.ch[1]
   MLA150-2	—	—	Maximum substrate size 200 x 200 x 12 mm; 375 nm laser power 7200 mW; writing time with 375 nm laser on a 100 mm wafer is < 9 min (Fast mode); includes high aspect ratio and grayscale lithography features.	epfl.ch[1]

Sources