Waferpedia

Tool family

Lam Research Concept One 150

Models in this family

  1. Lam / Novellus Concept One 150 PECVD-TEOS is a plasma-enhanced chemical vapor deposition system for TEOS deposition on 6-inch wafers.

All entries

  1. Concept One 150Lam Research
    CategoryDeposition
    16 specs
  2. Concept One 150 PECVD-TEOSLam Research

    Lam / Novellus Concept One 150 PECVD-TEOS is a plasma-enhanced chemical vapor deposition system for TEOS deposition on 6-inch wafers.

    CategoryDeposition
    4 specs