Tool family
Nikon 1505 is referenced in a lithography process condition as a g-line exposure tool with 0.54 NA.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Nikon 1505 G 6 E | g-line | 1988 | A g-line stepper with 5x reduction and 650 nm resolution. | waferpedia.com[1] |
| Nikon 1505 G 7 E | — | — | A stepper used in lithography on 6-inch wafers with a 5-inch reticle. | waferpedia.com[2] |
| 1505 G 6 E | g-line | 1988 | A g-line stepper with 5x reduction and 650 nm resolution. | waferpedia.com[2] |
| 1505 G 7 E | — | — | A stepper used in lithography on 6-inch wafers with a 5-inch reticle. | waferpedia.com[2] |
The Nikon 1505 G 6 E is a g-line stepper introduced in 1988 with a numerical aperture of 0.54 and a resolution of 650 nm.
The Nikon 1505 G 7 E is a stepper used in lithography on 6-inch wafers with a 5-inch reticle.
Nikon 1505 is referenced in a lithography process condition as a g-line exposure tool with 0.54 NA.
The Nikon 1505 G 6 E is a g-line stepper introduced in 1988 with a numerical aperture of 0.54 and a resolution of 650 nm.
The Nikon 1505 G 7 E is a stepper used in lithography on 6-inch wafers with a 5-inch reticle.