Waferpedia

Tool family

Toho Technology FLX-2320-S

The Toho Technology FLX-2320-S measures changes in wafer or substrate radius of curvature caused by deposition of a stressed thin film.

Models in this family

  1. The Toho Technology FLX-2320-S measures changes in wafer or substrate radius of curvature caused by deposition of a stressed thin film.