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FLX-2320-S

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

FLX-2320-S — epfl.ch
Fig. 01FLX-2320-Sepfl.ch[1]
  • Plate 01KLA-Tencor FLX-2320 Film Stress Measurement System (ID# 4344)

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What is it?

The FLX-2320-S is described as a system used to measure the change in the radius of curvature of a wafer or substrate caused by stressed thin-film deposition. The source explains that it is used to determine thin-film stress by measuring curvature before and after deposition and provides a user manual and calculator for the system.

What can it run?

Process applications and technology nodes documented for this tool.

  • Thin-film stress measurement

What do the numbers mean?

Wafer handling1

Measurement principle
Measures the change in the radius of curvature of a wafer or substrate caused by deposition of a stressed thin film.[1]
Accurate?

Configuration & options1

Use case
Thin-film stress measurement.[1]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What does the FLX-2320-S measure?

It measures the change in the radius of curvature of a wafer or substrate caused by deposition of a stressed thin film.[1]

What does the instrument calculate from that measurement?

It is used to determine thin-film stress using the substrate's biaxial elastic modulus, substrate thickness, film thickness, and radius of curvature.[1]

When must the radius be measured?

The radius has to be measured before and after the deposition.[1]

What is one stated use of the calculator provided with the system page?

It can be used to calculate the film thickness required to correct the bow of a substrate.[1]

Not publicly documented

The following facts about the FLX-2320-S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the FLX-2320-S are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FLX-2320-S are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the FLX-2320-S are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the FLX-2320-S are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the FLX-2320-S are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.chepfl.ch
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Last updated Jul 29, 2026.

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