Metrology & Inspection

The FEI Nova 600i (also called Nova NanoLab 600i) is a DualBeam system combining a field emission scanning electron microscope (FESEM) with a gallium focused ion beam (Ga FIB) for nanoscale prototyping, machining, characterization, and analysis of structures below 100 nm.

The Leica DM2700 M is an upright materials microscope with universal white light LED illumination designed for routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research.

The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.

The Filmetrics F50-UV is a thin-film metrology tool that measures film thickness via spectroscopic reflectometry and can generate thickness uniformity maps.

The Filmetrics R50 – 200 – 4PP is a metrology tool configured by default for metallic layers and sample thicknesses of 525 µm ± 25 µm.

The Nikon MM40 is an inspection and 2-D metrology microscope.

The KLA 2132 is a patterned wafer defect inspection tool that uses brightfield, small-pixel, high data rate digital image processing to detect yield-relevant defects.

The Olympus MX51 is a universal reflected-light large stage microscope for industrial and semiconductor inspection, supporting brightfield, darkfield, and fluorescence observation.

The KLA 200 series is a pattern inspection station used for reticle and photomask inspection.

The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.

The KLA AlphaStep D-300 is a stylus-based surface profiler that measures step heights from 50 nm to 300 µm.

The Applied Materials NanoSEM 3 D CD-SEM is a critical dimension scanning electron microscope for 6-inch wafers, manufactured in 2001.

The Thermo Fisher Scientific / FEI Sirion is a scanning electron microscope (SEM) used for imaging and analysis at high magnifications.

The KLA 1.112 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 inspection systems.

The Koh Young KY 8080 SPI is an in-line, fully automated solder paste inspection system that uses patented shadow-free Moiré camera technology for 3D inspection.

The Sonoscan D 9000 C-SAM is an acoustic micro imaging system used for non-destructive inspection.

The KLA Archer 300 is an overlay metrology system for optical overlay measurements on 300mm wafers.

The Bruker InSight 3 DAFM Photomask Atomic Force Microscope is a photomask atomic force microscope designed for 12-inch wafers.

The Hitachi S 9260 A is a CD-SEM used for critical dimension measurement in semiconductor manufacturing.

The Applied Materials G 3 Lite is an inspection system.

Zeiss 200 mm Scanning Electron Microscope.

The Thermo Fisher Scientific Nicolet 6700 FT-IR spectrometer is a Fourier transform infrared spectrometer that can be configured with the Continuum microscope.

Veeco / Wyko NT 3300 Surface Profilometer is a surface profilometer used for metrology and inspection.

The Onto Innovation NSX 105 Macro Defect is a macro defect inspection system for 300 mm wafers.

The Orbotech Ultra Fusion Series is an inspection system with a minimum line/space of 5/5 μm and a minimum defect size of 1.2 μm.

The Hitachi S 9200 is a scanning electron microscope (SEM) used for critical dimension (CD) measurements and wafer inspection, designed for 8-inch wafer processing.

The Morgagni 268 is a Transmission Electron Microscope (TEM) manufactured by Thermo Fisher Scientific / FEI.

The KLA Surfscan SP 1 TBI Keyboard is a keyboard-only replacement part for the KLA Surfscan SP 1 TBI system.

The Hitachi S 4800 is a field emission scanning electron microscope with a cold field-emission source and 12-inch wafer capability.

KLA P-7 is a research grade stylus profiler for surface metrology and measurement.

The Applied Materials G 3 Lite is a scanning electron microscope (SEM) for review applications.

The KLA Surfscan 7700 is a particle defect inspection system.

Veeco Dektak 150 is a stylus-based surface profiler used for measuring surface topography and thin film step heights.

KLA Surfscan SP 1 TBI is an unpatterned wafer inspection system with triple-beam illumination and brightfield capability.

The KLA Tencor P-17 is an eighth-generation benchtop stylus profiler for measuring step height, roughness, bow, and stress on substrates up to 200 mm.

Thermo Fisher Scientific / FEI Helios NanoLab 1200 HP is a FIB-SEM (Focused Ion Beam - Scanning Electron Microscope) configured as a Full Wafer Dual Beam system.

Applied Materials SEMVision G 3 is an inspection system described with 8-inch and 12-inch wafer handling capability.

The Hitachi SU 8030 FEG-SEM is a field emission gun scanning electron microscope.

The KLA Tencor P-2 is a profilometer with a 200 mm sample table with vacuum and a 3D scan option.

Zeiss manufactures inverted metallurgical microscopes for reflected-light materials analysis, including the Axio Vert.A1 MET and Axiovert 100A models.

The KLA 2133 Brightfield is a wafer inspection tool for 6-inch wafers.

The KLA Archer 10 XT Overlay System is a 200mm overlay metrology system with refurbishment-upgraded components and software version 5.6.

The KLA Tencor D600 is a stylus surface profiler for thin and thick film step height measurement.