Metrology & Inspection

The Hitachi S 9200 is a scanning electron microscope (SEM) used for critical dimension (CD) measurements and wafer inspection, designed for 8-inch wafer processing.

The FEI Nova 600i (also called Nova NanoLab 600i) is a DualBeam system combining a field emission scanning electron microscope (FESEM) with a gallium focused ion beam (Ga FIB) for nanoscale prototyping, machining, characterization, and analysis of structures below 100 nm.

The Leica DM2700 M is an upright materials microscope with universal white light LED illumination designed for routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research.

The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.

The Filmetrics R50 – 200 – 4PP is a metrology tool configured by default for metallic layers and sample thicknesses of 525 µm ± 25 µm.

The Olympus MX51 is a universal reflected-light large stage microscope for industrial and semiconductor inspection, supporting brightfield, darkfield, and fluorescence observation.

The KLA eS 32 is an E-Beam Inspection System.

The KLA 200 series is a pattern inspection station used for reticle and photomask inspection.

The Thermo Fisher Scientific / FEI Strata 400 S STEM is a scanning transmission electron microscope.

The Mitutoyo M Plan NUV 50 Microscope Objective is a microscope objective categorized under Metrology & Inspection.

The KLA AlphaStep D-300 is a stylus-based surface profiler that measures step heights from 50 nm to 300 µm.

Mitutoyo Crysta Plus M 574 is a manual coordinate measuring machine with Renishaw MH20i/TP20 probing and MCOSMOS M1 software.

The Thermo Fisher Scientific / FEI Sirion is a scanning electron microscope (SEM) used for imaging and analysis at high magnifications.

KLA F 60 is a film thickness measurement tool used in semiconductor metrology and inspection.

The KLA 1.112 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 inspection systems.

The KLA SLF 17 is an inspection system.

The Rigaku Ultima III is a diffractometer configured with a high-speed silicon strip detector, automatic sample exchange, X-ray generator, multiple detector and optics options, and a five-axis high-precision goniometer.

KLA Candela CS 2 Surface is a metrology and inspection tool described as a surface inspection system and surface analyzer.

The Bruker/Veeco 5000 is an atomic force microscope (AFM) manufactured by Bruker (formerly Veeco).

The Koh Young KY 8080 SPI is an in-line, fully automated solder paste inspection system that uses patented shadow-free Moiré camera technology for 3D inspection.

The Sonoscan D 9000 C-SAM is an acoustic micro imaging system used for non-destructive inspection.

The KLA Archer 300 is an overlay metrology system for optical overlay measurements on 300mm wafers.

The Bruker InSight 3 DAFM Photomask Atomic Force Microscope is a photomask atomic force microscope designed for 12-inch wafers.

The Applied Materials 9500 XR Source Bushing is an X-ray shielded bushing used in metrology and inspection applications.

The KLA 8100 XP is a critical dimension scanning electron microscope (CD-SEM) designed for automated CD measurements on silicon wafers and reticles, featuring production-proven electron optics for bottom imaging of high aspect ratio structures.

The Rudolph E25 System is an automated wafer edge top and edge normal inspection system for 300 mm wafers.

The Thermo Fisher Scientific FEI XL 30 E-SEM is an environmental scanning electron microscope (E-SEM) classified under metrology and inspection equipment.

The Ultratech CGS 300 Stress Measurement is a semiconductor wafer stress measurement system associated with 12-inch wafers.

The KLA Alpha Step D 500 Wafer Profiler Meter is a stylus profiler for 2D step height measurement, roughness, bow, and stress metrology.

The Leica S9 is a Greenough-type stereomicroscope with a 9:1 zoom and magnification range of 6.1x-55x.

The Parmi HS 60 SPI is a solder paste inspection system for metrology and inspection applications.

The LEO 1450 VPSE is a variable-pressure scanning electron microscope (SEM) platform with mounted EDS microanalysis, a BSE detector system, active isolation, and dedicated control terminals.

The Onto Innovation NSX 105 Macro Defect is a macro defect inspection system for 300 mm wafers.

The ONTO / Rudolph / August NSX 100 is an inspection system.

The Koh Young KY 8030 M SPI is a solder paste inspection system used in electronics manufacturing.

Thermo Fisher Scientific / FEI Nova NanoLab 200 is a dual-beam Ga FIB-SEM with a focused ion beam and scanning electron microscope configuration.

The Nikon Eclipse L 200 is an IC inspection microscope. The Nikon Eclipse L 200 has 6-inch wafer support.

The Thermo Fisher Scientific FEI NanoSEM 600 is a scanning electron microscope in the Metrology & Inspection category.

The Malvern Panalytical Empyrean is a multi-purpose X-ray diffractometer.

The Sonix SAM Autowafer is a scanning acoustic microscope for bond inspection.

The Morgagni 268 is a Transmission Electron Microscope (TEM) manufactured by Thermo Fisher Scientific / FEI.

The KLA P 16 Surface is a surface profilometer described as a fully refurbished unit with Windows XP, extended range up to 1 mm, and a 3D option.

The Bruker Dimension 340 is an atomic force microscope (AFM) originally introduced as a Veeco system.

The KLA Surfscan SP 1 TBI Keyboard is a keyboard-only replacement part for the KLA Surfscan SP 1 TBI system.

The Hitachi S 4800 is a field emission scanning electron microscope with a cold field-emission source and 12-inch wafer capability.

The Applied Materials G 3 Lite is a scanning electron microscope (SEM) for review applications.

The Nikon Eclipse LV 150 is a microscope from Nikon.

The KLA Surfscan 7700 is a particle defect inspection system.

The KLA Candela CS 10 R Wafer Inspector is a single-phase wafer inspector with a 50/60 Hz, 5 A power specification and a booting upgrade requirement.

The Hitachi S 9380 is a CD-SEM (Critical Dimension Scanning Electron Microscope).

The Rigaku 2991 E 1 is an X-ray system in the Metrology & Inspection category.

The Applied Materials UVision 5 Brightfield is a UV wafer inspection system supporting 12 inch (300 mm) wafers.

Applied Materials UVision 3 Brightfield is an inspection tool described with a FOUP-based loading configuration and Windows XP operating software.

The KLA 5100 Overlay Measurement System is an overlay measurement system with an 8-inch wafer size.

The Veeco / Wyko NT 9800 Optical Profilometer is an optical profilometer identified with a single-phase, 50/60 Hz, 115/230 V, 375 VA power specification.

The KLA RS 75 Resistivity Mapper is a resistivity mapping tool for 8-inch wafers.