Waferpedia

Tool family

YES R1

YESWet Processing / Clean1 entry

YES R1 is referenced as a 5-minute argon plasma clean machine used as the calibration benchmark for lead frame plasma cleaning systems.

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Models in this family

  1. R1Legacy

    Cited variants

    DesignationGenerationVintageChangesSource
    R3A-LMC——The source states it is specifically designed for fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines, with parallel plate design, three plasma modes, two plasma gas inputs, and a back-fill gas input.web.archive.org[1]

Sources

Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org