Wet Processing / Clean

The EVG 301 is a semi-automated single wafer cleaning system for R&D, featuring megasonic cleaning, spinner rotation up to 3000 rpm, and optional pre-bonding and IR-inspection modules.

The DISCO DCS1460 is an automatic cleaning system for Φ300 mm wafers used to clean workpieces that have been cut on a dicing saw.

The Ultratech 602 Plate Mask Cleaner is a cleaning tool designed for masks and plates in semiconductor manufacturing.

The Tokyo Electron Clean Track Lithius Pro V is a resist coater/developer for 12-inch wafers, described as a multi-block system.

The Tousimis Automegasamdri-915B is an automated critical point drying system for substrates up to 150 mm wafers.

The Karl Suss PM 5 Probe Station is a probe station with a stereo microscope, a 6-inch vacuum chuck, four micromanipulators, and a light-tight enclosure.

The SCREEN / DNS SS W 80 A-AR is a scrubber with 8 inch wafer size support.

The Oxford PRS900 is a computer-driven barrel reactor dedicated to dry resist stripping.

The YES CV200 RFS Plasma Strip / Descum System is a plasma stripping and descum tool for photoresist, polyimide, organics removal, and descum processes.

Tokyo Electron Clean Track Act 8 is an 8-inch coater/developer track with an interface unit for a Canon FPA-3000 i5 stepper and wafer edge exposure.

The SCREEN / DNS SP W 813 U is an 8-inch scrubber described as a frame oxide wet etch system with one channel, BHF 20:1, and rinse-and-dry capability.

General referenceSUSS MicroTec Mask is a wet processing and cleanroom class machine used for handling masks and related patterning hardware in semiconductor or precision optics manufacturing. It belongs to the class of equipment that supports mask cleaning, inspection, and preparation before use in downstream lithography or related process steps.

The Hitachi 16036 N is a clean bench system.

The Dektak 6M is a stylus profilometer used for film step-height measurement, surface topography profiling, and surface roughness measurement.

The Disco DCS 1440 is an automatic cleaning system used to clean workpieces cut on a dicing saw, supporting workpiece sizes up to 250 mm square.

Tokyo Electron NS 300 + Wafer Scrubber is a wet-process wafer scrubber for 8-inch wafers.

The Tokyo Electron NS 300 Z Wafer Scrubber is a 12-inch wafer scrubber with software version 6.00.26.2 and a 208 AC, 3-phase power rating.

Tokyo Electron Clean Track Lithius Pro Z i Resist is a coater/developer system described as a 12-inch multi block tool.

The YES 500 is an in-line plasma cleaner, described as the IL 500 AUTO In-Line Plasma System, a robotically loaded fully automatic plasma system.