Wet Processing / Clean

Tokyo Electron Clean Track Act 8 is a DUV clean track system for 8-inch wafers.

The Semitool 270 S L SRD is an automated spin rinse dryer used in semiconductor wafer processing.

ASML SERV.470.54502 is a sealed cleanroom part designated as an OIU Trackball Assembly.

The SCREEN / DNS 80 EX Wafer Scrubber is a wafer scrubber with 4 cleaning units, brush cleaning, and CO2 high-pressure washing.

The Tokyo Electron Clean Track Mark 7 is a coater/developer platform for semiconductor wafers, also used as the basis for the SS-series stand-alone scrubber system.

Veeco / SSEC Waferstorm 3300 / M 3303 / M 3304 is a single wafer processing system for 6-inch wafers.

The EVG 301 is a semi-automated single wafer cleaning system for R&D, featuring megasonic cleaning, spinner rotation up to 3000 rpm, and optional pre-bonding and IR-inspection modules.

The Lam/Novellus/Gasonics PEP 3510 Plus is a semiconductor processing tool that handles 8-inch wafers and includes a 2 kW microwave generator.

Tokyo Electron Clean Track Mark 5 coater described as a single coater with 3 pump dispensers, 2 hot plates, 2 cold plates, and one unknown station.

The YES CV200 RFS Plasma Strip / Descum System is a plasma stripping and descum tool for photoresist, polyimide, organics removal, and descum processes.

The YES G1000 Plasma Cleaning System is a plasma cleaning system for cleaning and low-temperature descum of substrates, surface modification, and gentle cleaning of inorganic substrates.

The YES-R1 is a bench-top plasma cleaner from Yield Engineering Systems that uses low-pressure gas plasma to remove organic contamination and surface-activate parts and substrates.

The YES R3A is a low-frequency, batch-process plasma cleaning system designed for surface treatment of wafers.

The Semitool ST 270 SRD is a spin rinse dryer configured for 4-inch wafers.

Semitool SST C 742 280 is a batch wafer processing system stated to handle 8-inch wafers.

The SCREEN / DNS FC 3000 is a batch wafer processing system for 12-inch wafers.

The Disco DFL 7161 is a fully automatic laser saw for 300 mm wafers that performs ablation processing with integrated coating and cleaning.

The SSEC M 3306 is a cleaner manufactured in 2009.

The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.

The Kulicke & Soffa 972 Mask is a mask cleaner used in semiconductor wet processing.

The SUSS Mask is a mask aligner used for photolithography.

The Oxford PRS900 is a computer-driven barrel reactor dedicated to dry resist stripping.

Tokyo Electron Clean Track Act 8 is an 8-inch coater/developer track with an interface unit for a Canon FPA-3000 i5 stepper and wafer edge exposure.

The Wafab Aeris FTB is a wet bench for semiconductor wet processing and cleaning.

The Dektak 6M is a stylus profilometer used for film step-height measurement, surface topography profiling, and surface roughness measurement.

The Branson 5210 DTH Ultrasonic is an ultrasonic cleaner in the Wet Processing / Clean category.

The Semitool EQ 222 SR Spray Solvent is a spray solvent tool used in semiconductor manufacturing.

SCREEN MP 30 Wet Process is a wet processing and clean equipment model from SCREEN.

The Disco DCS 1440 is an automatic cleaning system used to clean workpieces cut on a dicing saw, supporting workpiece sizes up to 250 mm square.

The Solitec Mask Cleaner is a wet processing tool used for cleaning photomasks in semiconductor manufacturing.

The SUSS AS 8 Spray Coater is a semi-automatic spray coater for substrates up to 200mm or 300mm in diameter and square substrates up to 6 inches edge length.

The Wafab 48" WPP is a wet bench.

The Veeco / SSEC ML 3300 is a single wafer cleaner that accommodates 8 inch wafers.

The EVG 301 Cleaning System is a manual wafer loading cleaning system with a camera for bond void inspection.

The Semitool A 870 S is a centrifugal dryer.

The Expedius I Batch Cleaner is a batch cleaning system for 12-inch (300mm) wafers.

The SCREEN / DNS FS 820 L is a wafer cleaner configured for 6-inch wafers.

The SCREEN SS 3100 is a scrubber classified under Wet Processing / Clean equipment.

The Gasonics L3500 is a plasma asher system designed for ashing and cleaning semiconductor wafers.

The SCREEN / DNS FC 3100 is a wafer cleaning system for 12-inch wafers.

The SCREEN SS W 60 A A Wafer is a wafer scrubber for 6-inch wafers, manufactured in 2000.

The GaSonics AURA 1000 is an automated stripper system.

The Tokyo Electron UW 300 is a wafer cleaner.

The Veeco / SSEC Waferstorm M 3305 is a lift off machine.

Lam Research SEZ 102 is a semiconductor tool identified with a 6 inch wafer size and 208 Vac, 3 phase, 50/60 Hz electrical specification.

The Tokyo Electron NS 300 Z Wafer Scrubber is a 12-inch wafer scrubber with software version 6.00.26.2 and a 208 AC, 3-phase power rating.

The Hitachi 16036 N is a clean bench system.

The Hitachi 1305 BSG 3 is a clean bench designed for wet processing and cleaning in semiconductor manufacturing.

General referenceThe SCREEN FC 821 L is a wet processing station within a class of automated systems used for chemical cleaning, rinsing, and drying of substrates in semiconductor and precision component manufacturing.

The SCREEN WS-820L is a high throughput batch cleaning system for 200 mm wafers with carrierless transfer processing.

The SCREEN/DNS SU 3100 is a single wafer cleaner for 12-inch wafers, categorized under wet processing/clean equipment.

The Tokyo Electron Clean Track Lithius is a coater/developer system for 200 mm wafers.