Applied Materials
MxP+ Poly
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials MxP+ Poly is a polysilicon etch chamber used in semiconductor fabrication. The MxP+ Poly is configured for 200mm wafers. The MxP+ Poly is used for polysilicon etching.[1]
What it is
The Applied Materials MxP+ Poly is a polysilicon etch chamber module used on Applied Materials cluster platforms. The module is part of the Centura 5200 system and the P5000 system. The MxP+ Poly chamber performs plasma-based etching of polysilicon layers. The chamber is classified under etch/ash/clean plasma processing equipment.[1][2][3]
How it works
The MxP+ Poly chamber uses radio-frequency (RF) power to generate a plasma from process gases for etching polysilicon. The chamber is equipped with an endpoint detection system using a monochromator. The system includes an RF generator, a turbo pump with controller, and a robot for wafer handling. The chamber is configured with an EDP (Endpoint Detection Processor) box. The module supports multiple process gases including NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, and HE/O2. The chamber uses a focus ring made of quartz. The MxP+ Poly chamber is available in a Mark II version with monochromator monitor.[2][1][4]
What do the numbers mean?
Vacuum & pumping1
Wafer handling3
Gas & chemistry2
Control & software1
Configuration & options10
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Applied Materials P5000 MxP+ Poly | — | — | Listed as a variant on the P5000 platform | asseta.com[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What platform does the MxP+ Poly chamber belong to?
The MxP+ Poly chamber is used on the Applied Materials Centura 5200 platform and the P5000 platform.[1][2]
What gases are used in the MxP+ Poly chamber?
The chamber uses process gases including NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, and HE/O2.[1]
Not publicly documented
The following facts about the MxP+ Poly are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MxP+ Poly are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MxP+ Poly are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MxP+ Poly are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MxP+ Poly is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MxP+ Poly are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]macquarie.com — macquarie.commacquarie.com
- [2]asseta.com — asseta.comasseta.com
- [3]Equipment inventory listing
- [4]AMAT Applied Materials 0200-10415 Focus Ring Quartz MXP+ Poly Refurbis – Semiconductor Spares Store — semiconductorspares.comsemiconductorspares.com
Last updated Aug 20, 2026.
