Applied Materials

The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.

The Applied Materials Centura Ultima+ HDP is a chemical vapor deposition system for 6-inch wafers, equipped with an ENI AM200 RF generator.

The Applied Materials Centura DPS Poly Etcher is a decoupled plasma source etching tool for 6-inch wafers.

The Applied Materials Centura I P 1 is an oxide etcher for 6-inch wafers.

The Applied Materials Centura I Phase II Oxide Etcher (also known as the 5200 Centura I Phase II) is an oxide etcher configured for 6-inch wafers with an upgrade path to 200 mm wafers.

The Applied Materials Centura TPCC RTP XE+ is an etcher designed for 8-inch wafers.

The Applied Materials Producer III is a chemical vapor deposition (CVD) system.

Applied Materials 0720 15139 is a part described as a Skt Pin 20-24 Awg Mate-N-Lok.

The Applied Materials 0720 01226 Part is a 3-position nylon connector housing cap.

The Applied Materials CB CP 22 101268 Part is a wire high voltage strand rated 22 AWG, 20 kVDC, and 150°C with silicon insulation.

Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.

The Applied Materials 3500 00107 Part is a Nut Keps 10-24 Ext-Tooth-Wshr Sst Psvt.

Applied Materials Endura 2 is a 12-inch PVD (physical vapor deposition) system used for liner/barrier and front-end metallization applications.

The Applied Materials 9500 XR Source Bushing is an X-ray shielded bushing used in metrology and inspection applications.

The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.

The Applied Materials 0720 07309 is a connector plug with 3 positions, rectangular shape, and 3.6mm diameter contact.

The Applied Materials 0041 27342 Part is a component described as a top plate, RF filter box, and E-chuck.

The Applied Materials CN CP 00 147893 is a connector receptacle housing with 9 positions, model CN CP 00 147893.

The Applied Materials 0020 40972 Spacer, RF Coil is a spare part for the HDPCVD Ultima+ system.

The Applied Materials 0041 32922 Part is a cover for an RF filter and Dz heater, used in the Producer GT system.

The Applied Materials CENG 2 is a dry etcher used in semiconductor manufacturing.

The Applied Materials UVision 3 is a DUV brightfield wafer inspection tool introduced in 2007, offering 40% faster throughput and 20 nm sensitivity for 45 nm FEOL and immersion lithography.

The Applied Materials 0720 01297 part is a connector socket contact for 20-14 AWG wire, made of brass with gold plating.

The Applied Materials TSVCTISET 07935 Coil is a coil component designated as NQ, IMP EB 3 for use with an Applied Materials P 5200 tool.

The Applied Materials Centura DPS 2 G 5 is a semiconductor etcher with Metal 3ch and Axiom 1ch configuration, manufactured in 2008.

Applied Materials P 16 072 Ancolyzer is a lithography-related semiconductor equipment model described as an Ancolyzer system with dosage additive, slipstreams with pump, dosing VMS with bleed and feed, bulk fill tanks, additional doses of H2O2 and H2SO4, and scanner software.

The Applied Materials / Varian VIISta 810 XEri is an ion implanter described as a 12-inch medium current system.

The Applied Materials / Varian E 500 HP is an implanter described as a medium current ion implantation system for 8-inch wafers.

The Applied Materials 0720 02358 is an Applied Materials part described as 'Conn Guide Skt Corner 104cf Pos'.

The Applied Materials G 3 Lite is a scanning electron microscope (SEM) for review applications.

The Applied Materials Centura Ultima TE HDP is a high-density plasma chemical vapor deposition (HDP CVD) system for 8-inch wafers, configured with one Ultima TE chamber, two DxZ nitride chambers, one wafer orienter chamber, and one multi-slot cooldown chamber.

Applied Materials Charger UMB is a PVD (physical vapor deposition) mainframe with 3 chambers and compatibility with Endura.

Applied Materials / Varian VIISta 810 is a 12-inch medium current implanter.

The Applied Materials Centura Super E is an 8-inch etch system with three chambers and wide body loadlocks.

Applied Materials Producer GT APF is a PECVD (plasma-enhanced chemical vapor deposition) system.

The Applied Materials HEXP VIISta HE is an ion implantation tool for 200mm wafers.

The Applied Materials Reflexion LK Prime is a CMP (Chemical Mechanical Polisher) system.

The Applied Materials UVision 5 Brightfield is a UV wafer inspection system supporting 12 inch (300 mm) wafers.

Applied Materials UVision 3 Brightfield is an inspection tool described with a FOUP-based loading configuration and Windows XP operating software.

The Applied Materials Centura eMXP+ is an etch tool for 8-inch wafers, configured for oxide and nitride spacer processes, with a 208 VAC electrical supply and software version E4.8_26.

Applied Materials Centura Dry Etcher is a 3-chamber Ultima dry etcher with 1 cool down and 1 orienter/degas, using BCL3, C2, SF6, He, and Ar gases.

The Applied Materials Producer XP APF Kodiak is a plasma-enhanced chemical vapor deposition (PECVD) system for 300mm wafers with three Kodiac chambers.