J.A. Woollam

Spectroscopic ellipsometry uses polarized light after interaction with a surface to determine refractive indices and thicknesses of thin films. In this method, linearly polarized light is directed at a material at a certain angle of incidence, separated into parallel and perpendicular components, and the reflected light becomes elliptically polarized.[1]
The instrument estimates thickness from measurements of the ratio Rp/Rs, the reflection coefficients of the s- and p-components, with Ψ and Δ related to film thickness and refractive index. It does not directly measure refractive index or thickness; an algorithm is used to resolve those values from Ψ and Δ.[1]
The system includes a xenon arc lamp light source, a wavelength range from 210 nm to 2500 nm, an X-Y-Z motorized stage, motorized Z and autofocus, and an automatic tilt alignment routine.[1]
The instrument is used for dielectric and semiconductor films such as silicon dioxide, silicon nitride, polysilicon, and amorphous silicon.[1]
It is also used for metallic films, with the note that the film generally needs to be very thin, and for organic layers such as carbon and photosensitive resists.[1]
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Last updated Jul 29, 2026.
The Perkin Elmer 1050 UV-VIS Spectrometer is an instrument used for analyzing ultraviolet and visible light absorption spectra.