Waferpedia

Laurell

EDC-650-23

Spin coater / spin processor150mmLaurell EDC-650-23 family
Research Quality: 40% complete
LinkedIn X Email
EDC-650-23 — web.archive.org
Fig. 01EDC-650-23web.archive.org[1]

Wafer size

150mm

Power

95 to 240 VAC, 47/63 HZ, ~300 Watts[1]

Vacuum

12,000 RPM with vacuum hold-down[1]

What is it?

The Laurell EDC-650-23 is described as a compact 650-series EDC spin processor with station-mounted configuration. The sources state that it accommodates up to Ø 150 mm wafers and 5" × 5" substrates, has a 12,000 RPM capability with vacuum hold-down, and is recommended for 3,000 RPM use with non-vacuum chucks.

What can it run?

Process applications and technology nodes documented for this tool.

  • Etch
  • Develop
  • Clean

What do the numbers mean?

Power & electrical1

Power
95 to 240 VAC, 47/63 HZ, ~300 Watts[1]2 sources
Accurate?

Vacuum & pumping2

Maximum rotational capability
12,000 RPM with vacuum hold-down[1]
Accurate?
Recommended rotational speed
3,000 RPM with non-vacuum chucks[1]
Accurate?

Wafer handling2

Wafer capacity
Up to Ø 150 mm wafers[1]2 sources
Accurate?
Substrate capacity
Up to 5" × 5" (127 mm × 127 mm) substrates[1]2 sources
Accurate?

Configuration & options3

Model
EDC-650-23[1]2 sources
Accurate?
Series
650-series EDC system[1]
Accurate?
Station mounted[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
EDC-650-23 B——Listed as the station-mounted EDC-650-23 B version of the EDC system.web.archive.org[1]
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Maximum rotational capability12,000 RPM with vacuum hold-down[1]
  • Recommended rotational speed3,000 RPM with non-vacuum chucks[1]
  • Power95 to 240 VAC, 47/63 HZ, ~300 Watts[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the EDC-650-23 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-650-23 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the EDC-650-23 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EDC-650-23 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EDC-650-23 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the EDC-650-23 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]web.archive.org — web.archive.orgweb.archive.org
  3. [3]web.archive.org — web.archive.orgweb.archive.org
  4. [4]EDC-650-23 Spin Coater - Laurell Technologies — images.laurell.comimages.laurell.com
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →
EDC-650-15Laurell

The Laurell EDC-650-15 is a station-mounted 650-series spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.

CategorySpin coater / spin processorWafer300mm
12 specs
EDC-650-23 vs EDC-650-15 →