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Laurell

EDC-650-15

Spin coater / spin processor300mm650-seriesLaurell EDC-650-15 family
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EDC-650-15 — web.archive.org
Fig. 01EDC-650-15web.archive.org[1]

Wafer size

300mm

Power

95 to 240 VAC, 47/63 Hz, ~300 W[1]

Vacuum

12,000 RPM with vacuum hold-down[1]

What is it?

The Laurell EDC-650-15 B spin processor is described as compact and equipped with advanced features. The sources state that it accommodates up to Ø 300 mm wafers and 9" × 9" (229 mm × 229 mm) substrates, has a 12,000 RPM capability with vacuum hold-down, and is recommended for 3,000 RPM and non-vacuum chucks.

What can it run?

Process applications and technology nodes documented for this tool.

  • Etch
  • Develop
  • Clean

What do the numbers mean?

Power & electrical1

Power
95 to 240 VAC, 47/63 Hz, ~300 W[1]
Accurate?

Vacuum & pumping4

Maximum speed capability
12,000 RPM with vacuum hold-down[1]
Accurate?
Recommended chuck type
non-vacuum chucks[1]
Accurate?
Required nitrogen/CDA purge pressure
60–70 PSIG (4–5 bar)[1]
Accurate?
Suggested vacuum
25–28 inches Hg[1]
Accurate?

Wafer handling2

Wafer capacity
up to Ø 300 mm wafers[1]
Accurate?
Substrate capacity
9" × 9" (229 mm × 229 mm) substrates[1]
Accurate?

Gas & chemistry1

Supported processes
Etch, Develop, Clean, typically followed by solvent or aqueous rinse, then dry[1]
Accurate?

Control & software1

Process controller
650-series process controller[1]
Accurate?

Configuration & options3

Model
EDC-650-15 B[1]
Accurate?
System type
Station mounted EDC-650-15 spin processor[1]
Accurate?
Recommended speed
3,000 RPM[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
EDC-650-15 B650-series—Variant designation shown in the sources; no differences versus the base line are explicitly stated.web.archive.org[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Maximum speed capability12,000 RPM with vacuum hold-down[1]
  • Recommended chuck typenon-vacuum chucks[1]
  • Power95 to 240 VAC, 47/63 Hz, ~300 W[1]
  • Required nitrogen/CDA purge pressure60–70 PSIG (4–5 bar)[1]
  • Suggested vacuum25–28 inches Hg[1]
  • Supported processesEtch, Develop, Clean, typically followed by solvent or aqueous rinse, then dry[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the EDC-650-15 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-650-15 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the EDC-650-15 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EDC-650-15 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EDC-650-15 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the EDC-650-15 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]web.archive.org — web.archive.orgweb.archive.org
  3. [3]web.archive.org — web.archive.orgweb.archive.org
  4. [4]Spin Coater - Laurell Model EDC-650-15 — laurell.comlaurell.com
  5. [5]EDC-650-15 Spin Coater - Laurell Technologies — images.laurell.comimages.laurell.com
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Last updated Jul 29, 2026.

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