Laurell
WS-650MZ
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Laurell WS-650MZ is a spin coater. The Laurell WS-650Mz-23NPPB is used for spin coating resist and other materials on substrates. The Laurell WS-650Mz-23NPPB supports round substrates from 10–150 mm and square substrates up to 125 × 125 mm.[1][2]
What it is
The Laurell WS-650Mz-23NPPB is a spin coater. The Laurell WS-650Mz-23NPPB is used for spin coating resist and other materials on substrates.[1]
How it works
The Laurell WS-650Mz-23NPPB dispenses coating liquid onto a stationary substrate and then accelerates the substrate to a defined rotational speed for a set duration. The Laurell WS-650Mz-23NPPB uses a programmable logic controller. The Laurell WS-650Mz-23NPPB has a rotation speed range of 0–12,000 rpm. The Laurell WS-650Mz-23NPPB has speed accuracy of 1 rpm or better. The Laurell WS-650Mz-23NPPB supports at least 20 programs with at least 51 speed and time steps in each program. The Laurell WS-650Mz-23NPPB has a timer resolution of 0.1 s over a range of 1–5999.9 s per step. The Laurell WS-650Mz-23NPPB has controller accuracy below 0.006% of setpoint. The Laurell WS-650Mz-23NPPB has maximum acceleration of 80,000 rpm/s without load and 30,000 rpm/s with load.[4][2]
The Laurell WS-650Mz-23NPPB has an NPP natural polypropylene chamber. The Laurell WS-650Mz-23NPPB has a chamber diameter of 9.5 in, or 241 mm. The Laurell WS-650Mz-23NPPB supports round substrates from 10 mm to 150 mm in diameter and square substrates up to 125 × 125 mm. The Laurell WS-650Mz-23NPPB uses an oil-free vacuum pump with an adjustable vacuum range of 25–28 inHg, or 635–711 mmHg, and a flow capacity of at least 4.5 SCFM, or 0.11 m³/min.[4][2]
Where it fits in the process flow
General reference — not yet source-verifiedSpin coaters sit in the coating portion of a lithography or thin-film workflow. Spin coaters are typically used after substrate cleaning and before bake, exposure, development, or other pattern transfer steps. Spin coaters are also used in nonlithographic thin-film preparation before drying, curing, annealing, or characterization.
Applications
General reference — not yet source-verifiedSpin coaters are used to deposit uniform solution-based layers for lithography, dielectric coating, passivation, and functional film formation. Spin coaters are common in process development where film thickness, coating uniformity, and solvent compatibility are important.
What do the numbers mean?
Wafer handling1
Performance1
Configuration & options10
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of equipment is the Laurell WS-650Mz-23NPPB?
The Laurell WS-650Mz-23NPPB is a spin coater for spin coating resist and other materials on substrates.[1]
What substrate sizes does the Laurell WS-650Mz-23NPPB support?
The Laurell WS-650Mz-23NPPB supports round substrates from 10 mm to 150 mm in diameter and square substrates up to 125 × 125 mm.[4][2]
What speed range does the Laurell WS-650Mz-23NPPB provide?
The Laurell WS-650Mz-23NPPB provides a rotation speed range of 0–12,000 rpm with speed accuracy of 1 rpm or better.[4][2]
How programmable is the Laurell WS-650Mz-23NPPB?
The Laurell WS-650Mz-23NPPB supports at least 20 stored programs, and each program has at least 51 steps. The Laurell WS-650Mz-23NPPB has a process time range of 1–5999.9 s per step with 0.1 s resolution.[4][2]
What chamber and vacuum specifications are given for the Laurell WS-650Mz-23NPPB?
The Laurell WS-650Mz-23NPPB has an NPP natural polypropylene chamber with a 9.5 in, or 241 mm, chamber diameter. The Laurell WS-650Mz-23NPPB uses an oil-free vacuum pump with an adjustable vacuum range of 25–28 inHg, or 635–711 mmHg, and a flow capacity of at least 4.5 SCFM, or 0.11 m³/min.[4][2]
Not publicly documented
The following facts about the WS-650MZ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650MZ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS-650MZ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS-650MZ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-650MZ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-650MZ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]colorado.edu — colorado.educolorado.edu
- [2]instrumenthive.com — instrumenthive.cominstrumenthive.com
- [3]snsf.stanford.edu — snsf.stanford.edusnsf.stanford.edu
- [4]Laurell WS-650Mz-23NPPB Advanced Spin Coater for Semiconductor & Microelectronics Processing - InstrumentHive — instrumenthive.cominstrumenthive.com
Last updated Oct 16, 2026.