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Nanospec

210XP

ReflectometryNanospec 210XP family
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Nanospec210XP
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What is it?

The Nanospec 210XP appears in the Stanford Nanofabrication Facility equipment tables as a reflectometry instrument. The sources describe it as a non-contact spectro-reflectometry tool for measuring the thickness of transparent films greater than 300 Å on reflective substrates such as silicon, and also as a manual film thickness measurement tool for single or dual layer transparent films greater than 300 Å.

What can it run?

Process applications and technology nodes documented for this tool.

  • Reflectometry
  • Film thickness measurement

What do the numbers mean?

Wafer handling1

Substrates
Reflective substrates such as silicon[1]
Accurate?

Configuration & options4

Equipment type
Reflectometry[1]
Accurate?
Measurement method
Non-contact, spectro-reflectometry[1]
Accurate?
Measured films
Transparent films > 300 Å (up to two)[1]
Accurate?
Manual measurement description
Manual film thickness measurement for single or dual layer transparent films > 300 Å[2]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 210XP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 210XP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 210XP are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 210XP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 210XP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 210XP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
  2. [2]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
  3. [3]Equipment Name Table | Stanford Nanofabrication Facility — snfguide.stanford.edusnfguide.stanford.edu
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Last updated Jul 29, 2026.

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