3D

Electron beam lithography tools write patterns directly into electron-sensitive resist by scanning a focused electron beam under computer control. Electron beam lithography belongs to the patterning part of nanofabrication and is commonly used where maskless writing, flexible geometry definition, and research-oriented process development are important.

Electron beam lithography tools form patterns by steering a narrow beam across a resist-coated sample and locally changing the resist chemistry. Electron beam lithography tools commonly support imaging for navigation, alignment, and inspection in the same chamber. Nanoengineering configurations in this class can also extend beyond resist exposure into beam-assisted modification, localized deposition, or probing workflows on prepared samples.

Electron beam lithography tools are typically used after substrate preparation and resist coating, and before resist development and pattern transfer or lift-off. Electron beam lithography tools often serve research and prototype flows where direct writing is preferred over photomask-based exposure, and where users need to iterate layouts or fabricate specialized nanoscale structures.

Electron beam lithography tools are used for resist patterning in nanodevice development, photonic structures, test structures, and custom small-batch fabrication. Nanoengineering variants of this class are also used for exploratory process work that combines writing, imaging, and localized beam-driven modification on the same platform.