4 entries
- EBPG5200Raith
Raith EBPG5200 is a direct write electron beam lithography system with high-kV capability and automation features stated in the product page for the EBPG line.
CategoryLithographyWafer6" - EBPG5000RaithCategoryLithographyWafer150mmNodesub-10 nm
- EBPG5150Raith
The RAITH EBPG5150 is an electron beam lithography system described as a benchmark system for high-throughput, automated, high-precision nanolithography.
CategoryLithography - 3DRaith
Raith eLINE Plus is a multi-technique electron beam lithography and nanoengineering system with an open, upgradable platform and integrated nanomanipulation and focused electron beam induced process capabilities.
CategoryNanoengineering EBL tool
