Semitool

SST C 421 280 Batch Wafer Processing

Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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Power

50/60 Hz - 208 VAC - 3 Phase^[2]

Vacuum

Present^[3]

Gas delivery

N₂ / CO₂^[3]

What it is

The Semitool SST C 421 280 is a batch wafer processing machine.^[2]^[3]^[1]^[4]

Applications

The SST C 421 280 is used for semiconductor wafer batch processing.^[2]^[3]^[1]^[4]

What do the numbers mean?

Power & electrical2

Power: 50/60 Hz - 208 VAC - 3 Phase^[2]
Missing Components: Wafer Handler, Power Supply, AC Distribution Box, External Transformer, UPS, Backing Pump(s), Shipping Brackets^[3]

Vacuum & pumping3

Vacuum: Present^[3]
CDA: 65–70 PSI^[3]
DI Water: 35 PSI Minimum^[3]

Wafer handling2

Wafer Size: 6 inch^[1]
Wafer Size: 8 inch^[2]

Gas & chemistry1

Process Gas: N₂ / CO₂^[3]

Configuration & options8

Vintage: 2004^[3]
Vintage: 2001^[2]
Power: 208 VAC^[3]
Full Load Current: 30 A^[2]
Largest Motor or Load: 10 A (15 HTR)^[2]
Short Circuit Interrupt: 10,000 A^[2]
Heat Exchanger: Present^[3]
Condition Note: Visible Corrosion on Modules^[3]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Power50/60 Hz - 208 VAC - 3 Phase^[2]
VacuumPresent^[3]
CDA65–70 PSI^[3]
DI Water35 PSI Minimum^[3]
Process GasN₂ / CO₂^[3]
Missing ComponentsWafer Handler, Power Supply, AC Distribution Box, External Transformer, UPS, Backing Pump(s), Shipping Brackets^[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the SST C 421 280 Batch Wafer Processing are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SST C 421 280 Batch Wafer Processing are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SST C 421 280 Batch Wafer Processing are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SST C 421 280 Batch Wafer Processing are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SST C 421 280 Batch Wafer Processing are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SST C 421 280 Batch Wafer Processing is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources

[1]Equipment inventory listing
[2]Equipment inventory listing
[3]Equipment inventory listing
[4]Semitool SST-C-421-280 Batch Wafer Processing for sale — fabsurplus.comfabsurplus.com