91 entries
The Semitool SSTC 421270 is a wet glue remover used in semiconductor manufacturing.
The Semitool Equinox Spray Liftoff System is a six-head spray liftoff system with vintage years of 2008 and 2010.
Semitool R 208 FMC 2 is a single-wafer system configured for DHF, NH4OH, H2O2, H2SO4, and IPA.
The Semitool 4300 S SRD is a spin rinse dryer with a single-stack configuration and 200mm wafer particle specification.
The Semitool SST C 421 280 is a batch wafer processing system offered in configurations for 6-inch and 8-inch wafers.
The Semitool SST C 642 250 is a batch wafer processing system specified for 8-inch wafers.
The Semitool Equinox Semiconductor Wafer Electroplating System is a single-head manual plater with one 100mm process head and one 100mm SRD.
The Semitool 280 SRD is a spin rinse dryer system for semiconductor manufacturing.
Semitool Symphony 2300 Spray Acid is a 1-chamber equipment item identified by model name Symphony 2300.
The Semitool WSST 608 AG is a wet processing tool for 6-inch wafers.
Semitool Raider ECD 312 is an electroplating system described with 3-phase 50/60 Hz 380 V power and FOUP loadport handling.
The Semitool WST 305 M is a spin dryer.
The Semitool SST 201 SRD is a spin rinse dryer designed for 8-inch wafers with a single chamber configuration.
The Semitool 421 Scepter Spray Solvent Tool (SST) is a single-chamber batch solvent processor for wafer cleaning that processes up to 50 wafers.
The Semitool 870 is a spin rinser/dryer that rinses substrates in DI water to 15 MΩ and dries them with heated nitrogen.
The Semitool 421 Spray Solvent Tool (SST) is a batch solvent processor for wafer cleaning with an 8-inch/200mm maximum wafer size.
The Semitool 270 is a spin rinser/dryer for 3", 4", and 6" wafer boats.
The Semitool 880 is a spin rinser/dryer that rinses masks and wafers in DI water to 15 MΩ and dries them with heated nitrogen.
The Semitool 850 S-L is a spin rinse dryer.
Semitool SST C 742 280 is a batch wafer processing system stated to handle 8-inch wafers.