Strasbaugh
The Strasbaugh 6 DA DC 2 is a polisher. The Strasbaugh 6 DA DC 2 has 2 stations. The Strasbaugh 6 DA DC 2 is specified for 220V single-phase power at 18 amp.[1]

A chemical mechanical polisher removes material from a wafer surface by combining mechanical motion with a slurry-based chemical action.
A polisher of this class typically uses a rotating platen, a carrier or head that holds the wafer, and controlled pressure and speed to shape removal across the surface.
A chemical mechanical polisher sits in the planarization stage of the wafer process flow.
A chemical mechanical polisher is used after earlier patterning or film-deposition steps when a flatter surface is needed for later processing.
A chemical mechanical polisher is used for wafer planarization and surface conditioning in semiconductor fabrication.
A chemical mechanical polisher is used on semiconductor wafers that require controlled material removal and improved surface flatness.
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The Strasbaugh 6 DA DC 2 has two stations.[1]
The following facts about the 6 DA DC 2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6 DA DC 2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 6 DA DC 2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 6 DA DC 2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6 DA DC 2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6 DA DC 2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 12, 2026.
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