Temescal
The Temescal BJD 2000 is a batch-loading vacuum chamber evaporator. The Temescal BJD 2000 uses a 20-inch diameter hinged bell jar. The Temescal BJD 2000 is non-load-locked.[1][2][3]

Evaporation systems are deposition tools used after substrate preparation and before later patterning, lift-off, anneal, inspection, or packaging steps. Such tools are commonly placed where a process flow needs a vacuum-deposited film on wafers, pieces, or other substrates without the plasma architecture of sputter deposition.
Vacuum evaporators of this class are used to form thin conductive, resistive, optical, and adhesion films. Such systems are often used for metal stack development, lift-off patterning, contact formation, and coating tasks where directional line-of-sight deposition is useful.
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The following facts about the BJD 2000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the BJD 2000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the BJD 2000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the BJD 2000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the BJD 2000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the BJD 2000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 17, 2026.
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