YES
CV100PZ
Plate 01Yield Engineering CV100PZ Stripper - 6 inch Wafer Upgrade
Bid ServicellcWatch on YouTubePlate 02Yield Engineering CV100PZ Stripper
Bid ServicellcWatch on YouTube
Wafer size
6-8 in. (Auto Detect)
Power
120 V 20.0 A 60 Hz 1 Phase[2]
Gas delivery
Mass Flow Controllers[1]
What it is
General reference — not yet source-verifiedSingle-wafer resist strippers are dry process tools used to remove patterned organic films from individual wafers. Downstream ashers place the wafer outside the main plasma generation region so reactive species can remove resist with reduced direct ion bombardment at the wafer surface.
How it works
Applications
The YES CV100PZ is applied to photoresist removal, polyimide removal, organics removal, and descum processes.[2]
- Resist stripping
- Polymide removal
What do the numbers mean?
Power & electrical1
Wafer handling2
Gas & chemistry5
- End point detection
- Patented Gas Swirl End Point Detection of Resist and Polymide Removal[1]
Control & software1
Configuration & options4
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| YES-CV108 | — | — | — | web.archive.org[1] |
| YES-CV100PL-APS | — | — | wafer size: 2-6 in. (Auto Detect); strip rate up to 15,000 Å/min; < 10mV electron shift in 200Å Gate Oxide; RS232 communication standard; PLC Control / Touchscreen Interface; Patented Gas Swirl End Point Detection | web.archive.org[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- End point detectionPatented Gas Swirl End Point Detection of Resist and Polymide Removal[1]
- ControlsMass Flow Controllers; PLC Control / Touchscreen Interface[1]
- Endpoint detectionPatented Gas Swirl End Point Detection of Resist and Polymide Removal[1]
- Flow controlMass Flow Controllers[1]
- ApplicationsPhotoresist removal; Polyimide removal; Organics removal; Descum processes[2]
- Power requirements120 V 20.0 A 60 Hz 1 Phase[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the YES CV100PZ?
The YES CV100PZ is a single-wafer resist stripper and a microwave downstream asher.[1][2]
What processes is the YES CV100PZ used for?
The YES CV100PZ is used for photoresist removal, polyimide removal, organics removal, and descum processes.[2]
Does the YES CV100PZ have endpoint detection?
The YES CV100PZ has patented gas swirl end point detection.[1]
Not publicly documented
The following facts about the CV100PZ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CV100PZ are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the CV100PZ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CV100PZ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CV100PZ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the CV100PZ are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]semistarcorp.com — semistarcorp.comsemistarcorp.com
Last updated Oct 17, 2026.